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主要从事极紫外与X射线多层膜器件与系统研究，目前主持国家自然科学青年基金1项、国家重点研发计划子课题1项，参与国家自然科学基金重大科研仪器研制项目。先后发表论文20余篇，以第一/通讯（含共同）作者在ACS Applied Materials&Interfaces、Optics Letters、Vacuum等期刊发表SCI论文11篇，EI论文4篇，授权国家发明专利6项。2021年获上海市“超级博士后”资助，2022年获上海市科技进步奖二等奖（排名第十）。
隶属于“同济大学精密光学工程技术研究所”团队
[1] Wang,Z.; Lai, B.; Zhang, Z.; Chang, C.; Wu, Y.; Jiang, L.; Qi, R.; Huang, Q.; Zhang,Z.; Wang, Z. Impact of Mo Barrier Layers on the Interface and Microstructure ofAl/Sc Multilayers for the Extreme Ultraviolet Range. ACS Appl. Mater.Interfaces 2025, doi:10.1021/acsami.4c22676.
[2] Zhang,Z.; Qi, R.; Huang, Q.; Feng, Y.; Zhang, Z.; Huo, T.; Zhou, H.; Wang, Z.Narrowband Mg/SiC Multilayer Mirror Working as High-Harmonic Selector at 30.4Nm Wavelength. J. Opt. (United Kingdom) 2024, 26,doi:10.1088/2040-8986/ad3a79.
[3] Liu,X.; Zhang, Z.; Jiang, L.; Song, H.; Yao, D.; Huang, S.; Xu, W.; Huo, T.; Zhou,H.; Qi, R.; et al. Thickness Control and Thermal Stability of Large-DiameterMo/Si Multilayer Films for Extreme Ultraviolet Source. ZhongguoJiguang/Chinese J. Lasers 2024, 51, 1–9,doi:10.3788/CJL231540.
[4] Chang,C.; Wei, Z.; Jiang, H.; Ni, H.; Song, W.; He, J.; Xiang, S.; Wang, Z.; Zhang,Z.; Zhang, Z. Effect of Annealing on Stress, Microstructure, and Interfaces ofNiV/B4C Multilayers. Coatings 2024, 14,doi:10.3390/coatings14040513.
[5] Wang,Z.; Zhang, Z.; He, J.; Giglia, A.; Zhang, Q.; Qi, R.; Huang, Q.; Yi, S.; Zhang,Z.; Wang, Z. Structural and Optical Performance of NiV/Ti Multilayer Mirrorsfor Z-Pinch Plasma Diagnostic at the Wavelength Region of 350–450 eV. Opt.Lett. 2024, 49, 2237, doi:10.1364/ol.519527.
[6] Chang,C.; Wei, Z.; Zhang, Z.; Jiang, L.; Jiang, H.; Ma, H.; Zhang, Z.; Wang, Z.Annealing Process-Induced Microstructural Variation in NiV/B4C Multilayers. Appl.Sci. 2024, 14, 1–14, doi:10.3390/app142411664.
[7] Wang,Z.; Li, T.; Zhang, Z.; Chang, C.; Xia, J.; Zhang, Z.; Jiang, L.; Qi, R.; Huang,Q.; Zhang, Z.; et al. Evolution of Interface and Surface Morphology of WC/SiCMultilayers with Increase in Number of Bilayers. Vacuum 2024, 230,113750, doi:10.1016/j.vacuum.2024.113750.
[8] Zhang,Z.; Huang, Q.; Qi, R.; Zhang, Z.; Yi, S.; Li, W.; Yu, J.; Sheng, P.; Wang, Z.Development of High Efficiency and High Precision X-Ray Reflective Optics forAdvanced Light Sources at IPOE. Springer Proc. Phys. 2024, 403SPP, 145–154, doi:10.1007/978-3-031-65913-3_14.
[9] Wang,Z. Le; Zhang, Z.; Zhang, Y.X.; Xiang, S.M.; Wei, Z.B.; Wen, S.Y.; Wang, Z.S.Fabrication and Characterization of Multilayer Analyzer Crystals for X-RayFluorescence Analysis on Light Elements. Guang Pu Xue Yu Guang Pu FenXi/Spectroscopy Spectr. Anal. 2024, 44, 3120–3127,doi:10.3964/j.issn.1000-0593(2024)11-3120-08.
[10] Li,T.; Zhang, Z.; Wang, Z.; Jiang, L.; Qi, R.; Huang, Q.; Zhang, Z.; Wang, Z.Microstructure Evolution in Magnetron-Sputtered WC/SiC Multilayers with VariedWC Layer Thicknesses. Coatings 2024, 14, 720,doi:10.3390/coatings14060720.
[11] Song,H.; Zhang, Z.; Liu, X.; Huang, Q.; Zhou, H.; Huo, T.; Qi, R.; Zhang, Z.; Xin,Z.; Wang, Z. Comparison of Thermal Stability of Mo/Si Multilayers withDifferent Crystallinities of Mo Layers. Appl. Opt. 2023, 62,2636, doi:10.1364/ao.482940.
[12] Liu,X.; Zhang, Z.; Song, H.; Huang, Q.; Huo, T.; Zhou, H.; Qi, R.; Zhang, Z.; Wang,Z. Comparative Study on Microstructure of Mo/Si Multilayers Deposited on LargeCurved Mirror with and without the Shadow Mask. Micromachines 2023,14, doi:10.3390/mi14030526.
[13] Zhang,Z.; Yi, S.; Huang, Q.; Chen, S.; Li, W.; Zhang, Z.; Wang, Z. Research Progressof Normal-Incidence Optical System at Extreme Ultraviolet（EUV）wavelength.Guangxue Jingmi Gongcheng/Optics Precis. Eng. 2022, 30,2678–2687, doi:10.37188/OPE.20223021.2678.
[14] Wei,Z.; Zhang, Z.; Jiang, L.; Yang, Y.; Chang, C.; Feng, Y.; Qi, R.; Huang, Q.;Yan, W.; Xie, C.; et al. Background Pressure Induced Structural and ChemicalChange in NiV/B4C Multilayers Prepared by Magnetron Sputtering. Front. Phys.2022, 10, 1–10, doi:10.3389/fphy.2022.837819.
[15] Zhang,Z.; Qi, R.; Yao, Y.; Shi, Y.; Li, W.; Huang, Q.; Yi, S.; Zhang, Z.; Wang, Z.;Xie, C. Improving Thickness Uniformity of Mo/Si Multilayers on Curved SphericalSubstrates by a Masking Technique. Coatings 2019, 9,doi:10.3390/coatings9120851.
[16] Zhang,Z.; Li, W.; Huang, Q.; Zhang, Z.; Yi, S.; Pan, L.; Xie, C.; Wachulak, P.;Fiedorowicz, H.; Wang, Z. A Table-Top EUV Focusing Optical System with HighEnergy Density Using a Modified Schwarzschild Objective and a Laser-PlasmaLight Source. Rev. Sci. Instrum. 2018, 89,doi:10.1063/1.5044752.
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